Piranha solution is a mixture usually 3:1 ratio of concentrated sulfuric acid (H2SO4) and 25-30% hydrogen peroxide (H 2 O 2 ). Other types of phase may have a ratio of 4:1 or 7:1. Another similar solution, sometimes called basic piranha solution, is a 3:1 solution of ammonium hydroxide (NH 4 OH) and 25-30% hydrogen peroxide.
Piranha solution is used to clean organic contaminants on the surface of a substrate. Being a strong oxidizing agent, it can remove most organic materials. Piranha solution is also sometimes used for etching titanium.
Piranha solution can be explosive if the concentration of hydrogen peroxide is more than 50%.
When working with Piranha solution, it is necessary to be equipped with special labor protection such as goggles, plastic gloves, protective vests, masks and laboratory equipment such as fume hoods with higher wind speeds. or 0.4 m/s.
Piranha solution can be explosive if the concentration of hydrogen peroxide is more than 50%. Freshly mixed mixtures are very exothermic, up to 120 °C for acids and 60 °C for bases. When preparing the solution, the hydrogen peroxide must be poured rapidly into the concentrated sulfuric acid[1], because an exothermic reaction will occur immediately and gas will be produced, the sequence must not be changed. Do not mix this mixture with organic substances such as acetone (CH 3 COCH 3 ), isopropyl alcohol (C 3 H 8 O), nylon etc. because it will cause an explosion.
The destructive power of Piranha’s solution.
When handling the work, carefully and slowly immerse the material with organic stains into the Piranha solution bath. Substrate materials must be washed and dried before dipping. Do not store this solution in a container with a tight-fitting lid, the gas generated will cause the container to explode. Should be kept in a fume hood.
Piranha solution should be used immediately after preparation. The hot solution will wash away organic stains on the substrate, oxidizing and hydrolyzing most metal surfaces. Washing time is from 10 to 40 minutes. After removing the matrix material from the solution, rinse thoroughly with deionized (or distilled) water. To avoid thermal shock that can break the base material, when dipping into the bath, it should be dipped slowly.
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